Alfa Chemistry Analytical Products 4 - Products
Alfa Chemistry is a global leading supplier of analytical chemistry reagents, providing a wide range of analytical chemicals such as analytical standards for a variety of analytical applications.
| Product | Description | |
|---|---|---|
| Trichloro(1H,1H,2H,2H-perfluorooctyl)silane | 97%. Group: Silsesquioxanes: poss nanohybrids. |  |
| Trichloro[2-(chloromethyl)allyl]silane | 98%. Group: Silsesquioxanes: poss nanohybrids. | |
| Trichlorobenzenes in Water - WP | Proficiency Testing Material. Group: Waste water. | |
| Trichlorocyclopentylsilane | 95%. Group: Silsesquioxanes: poss nanohybrids. | |
| Trichloro(dichloromethyl)silane | 96%. Group: Self assembly and lithography. | |
| Triclabendazole-(methyl-d3) | analytical standard. Group: Application areas. | |
| Triclabendazole sulfoxide | analytical standard. Group: Application areas. | |
| Triclosan-methyl | analytical standard. Group: Application areas. | |
| Tricosanoic acid-methyl ester | Tricosanoic acid-methyl ester. Uses: For analytical and research use. Group: Nutritional composition compounds. Alternative Names: Tricosanoic acid methyl ester. CAS No. 2433-97-8. IUPAC Name: methyl tricosanoate. Molecular formula: C24H48O2. Mole weight: 368.64. Catalog: APS2433978. SMILES: CCCCCCCCCCCCCCCCCCCCCCC(=O)OC. Format: Neat. Shipping: Room Temperature. | |
| Tricyclic cyclosporin A | Tricyclic cyclosporin A. Uses: For analytical and research use. Group: Impurity standards. CAS No. 153475-57-1. Molecular formula: C64H111N11O12S. Mole weight: 1258.72. Catalog: APB153475571. | |
| Triethanolamine borate | 97%. Group: Solution deposition precursors. | |
| Triethyl citrate | Chemical Class. Uses: For analytical and research use. Group: Reagents. Grades: analytical standard. CAS No. 77-93-0. Pack Sizes: 1ML. | |
| Triethyl Citrate | Pharmacopeia & Metrological Institutes Standards; API Standards. Uses: For analytical and research use. Group: Reagents. Alternative Names: Triethyl 2-hydroxypropane-1,2,3-tricarboxylate,Triethyl citrate. CAS No. 77-93-0. Pack Sizes: 500MG. IUPAC Name: triethyl 2-hydroxypropane-1,2,3-tricarboxylate. | |
| Triethylene glycol | United States Pharmacopeia (USP) Reference Standard. Group: Pharmacopeia & metrological institutes standardshydrocarbons & petrochemicalsstandards for food regulatory methods. Alternative Names: Trigol, Triglycol, 2-[2-(2-Hydroxyethoxy)ethoxy]ethanol, 1,8-Dihydroxy-3,6-dioxaoctane, 1,2-Bis(2-hydroxyethoxy)ethane, 3,6-Dioxaoctane-1,8-diol, 2,2'-[1,2-Ethanediylbis(oxy)]bis[ethanol], TEG (glycol), TEG,Triethylene glycol (8CI), 1,2-Di(?-hydroxyethoxy)ethane, NSC 60758, 2,2'-Ethylenedioxydiethanol, Crestwood A, Glycol bis(hydroxyethyl) ether, Hanlon TEG. | |
| Tri(ethylene glycol) bis(chloroformate) | 97%. Group: Poly(ethylene glycol) and poly(ethylene oxide). | |
| Triethylene glycol mono-11-mercaptoundecyl ether | 95%. Group: Self assembly and lithography. | |
| Triethylenethiophosphoramide 1 | Triethylenethiophosphoramide 1. Uses: For analytical and research use. Group: Impurity standards. CAS No. 1072-44-2. Molecular formula: C3H7N. Mole weight: 57.1. Catalog: APB1072442. | |
| Triethylenethiophosphoramide 6 | Triethylenethiophosphoramide 6. Uses: For analytical and research use. Group: Impurity standards. CAS No. 14056-57-6. Molecular formula: C4H9N2OPS. Mole weight: 164.16. Catalog: APB14056576. | |
| Triethylgermanium hydride | 98%. Group: Vapor deposition precursors. | |
| Triethylsulfonium bis(trifluoromethylsulfonyl)imide | for electrochemistry, ?95.0% (qNMR). Group: Supercapacitors. | |
| Trifluoperazine hydrochloride | meets USP testing specifications. Uses: For analytical and research use. Group: Fluorescence/luminescence spectroscopy; api standards; european pharmacopoeia (ph. eur.); pharmaceutical toxicology; pharmacopoeial standards. Alternative Names: SKF 5019, Stelazine, Tryptazine, Trifluoperazine hydrochloride,Trifluoperazine hydrochloride, 2-Trifluoromethyl-10-[3-(1-methyl-4-piperazinyl)propyl]phenothiazine dihydrochloride, Trazine, 10-[3-(4-methylpiperazin-1-yl)propyl]-2-(trifluoromethyl)-10H-phenothiazine dihydrochloride, Modalina, TFP, Triphthazine, Stelazine, Triphthasine, Trifluoroperazine hydrochloride, Fluoperazine, Eskazine, 10H-Phenothiazine, 10-[3-(4-methyl-1-piperazinyl)propyl]-2-(trifluoromethyl)-, hydrochloride (1:2)10H-Phenothiazine, 10-[3-(4-methyl-1-piperazinyl)propyl]-2-(trifluoromethyl)-, dihydrochloride (9CI), Triphthazine dihydrochloride, Tryptazine dihydrochloride, Triftazin, 2-Trifluoromethyl-10-[3'-(1-methyl-4-piperazinyl)propyl]phenothiazine dihydrochloride, Phenothiazine, 10-[3-(4-methyl-1-piperazinyl)propyl]-2-(trifluoromethyl)-, dihydrochloride (6CI,8CI), Trifluoroperazine dihydrochloride, Terfluzine, Trifluoperazine dihydrochloride, Eskazinyl, Jatroneural, SKF-5019-A2. CAS No. 440-17-5. Pack Sizes: 5G. IUPAC Name: 10-[3-(4-methylpiperazin-1-yl)propyl]-2-(trifluoromethyl)phenothiazine;dihydrochloride. Molecular formula: C21H24F3N3S.2ClH. Mole weight: 480.42. EC Number: 207-123-0. Catalog | |
| Triflupromazine-(dimethyl-d6) hydrochloride | analytical standard. Group: Antihistamines standards. | |
| Triflupromazine hydrochloride | analytical standard. Group: Antihistamines standards. | |
| Trihexyltetradecylphosphonium bis(trifluoromethylsulfonyl)amide | ?95.0%. Group: Supercapacitors. | |
| Trihexyltetradecylphosphonium bromide | ?95%. Group: Supercapacitors. | |
| Trimebutine | analytical standard. Group: Additional drugsapi standardspharmaceutical toxicology. Alternative Names: Trimebutine, BRL-9476, 3,4,5-Trimethoxybenzoic acid 2-(dimethylamino)-2-phenylbutyl ester, (+/-)-Trimebutine. | |
| Trimetazidine hydrochloride | Trimetazidine hydrochloride. Uses: For analytical and research use. Group: Impurity standards. CAS No. 13171-25-0. Molecular formula: C14H24Cl2N2O3. Mole weight: 339.26. Catalog: APB13171250. | |
| Trimethoprim-d9 | analytical standard. Group: Application areas. | |
| Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane | 98%. Group: Self assembly and lithography. | |
| Trimethoxy(2-phenylethyl)silane | 98%. Group: Silsesquioxanes: poss nanohybrids. | |
| Trimethoxy(3,3,3-trifluoropropyl)silane | ?97.0% (GC). Group: Self assembly and lithography. | |
| Trimethoxy[3-(methylamino)propyl]silane | 95%. Group: Self assembly and lithography. | |
| Trimethoxy(7-octen-1-yl)silane | technical grade, 80%. Group: Self assembly and lithography. | |
| Trimethoxy(octyl)silane | 96%. Group: Silsesquioxanes: poss nanohybrids. | |
| Trimethoxyphenylsilane | ?94%. Group: Silsesquioxanes: poss nanohybrids. | |
| Trimethylboron-d9 | electronic grade, 99.4% (CP), 99 atom % D. Group: Vapor deposition precursors. | |
| Trimethyl(phenylethynyl)tin | 97%. Group: Vapor deposition precursors. | |
| Trimethyl phosphate | Volatile Organic Compounds (VOCs); Environmental Food Contaminants. Uses: For analytical and research use. Group: Reagents. CAS No. 512-56-1. IUPAC Name: trimethyl phosphate. | |
| Trioctylphosphine | technical grade, 90%. Group: 25ml sure/seal reagents. | |
| Triosmium dodecacarbonyl | 98%. Group: Vapor deposition precursors. | |
| Triphenylarsine oxide | 97%. Group: Vapor deposition precursors. | |
| Triphenylbismuth | 98% (99.9% trace metals basis). Group: Vapor deposition precursors. | |
| Triphenylborane | powder, <2% H2O. Group: Vapor deposition precursors. | |
| Triphenylborane solution | 0.25 M in THF. Group: Solution deposition precursors. | |
| Triphenyl phosphate | 31P-qNMR Standard. Group: Quantitative nmrflame retardantsfood contact materials. Alternative Names: Disflamoll TP, TP, Triphenyl phosphate, Wako TPP, DHPF 005, TTP, S 4 (phosphate), TPP, WSFR-TPP, Reofos TPP, TFF,Phosphoric acid, triphenyl ester, S 4, Celluflex TPP, NSC 57868, Phoscon FR 903N, TTP (triphenyl phosphate), Phenyl phosphate ((PhO)3PO), Phosflex TPP, Triphenoxyphosphine oxide, Triphenol phosphate, TPPA, Sumilizer TPP. | |
| Triphenyl phosphate | quantitative NMR; Flame Retardants; Food Contact Materials. Uses: For analytical and research use. Group: Reagents. Alternative Names: Disflamoll TP, TP, Triphenyl phosphate, Wako TPP, DHPF 005, TTP, S 4 (phosphate), TPP, WSFR-TPP, Reofos TPP, TFF,Phosphoric acid, triphenyl ester, S 4, Celluflex TPP, NSC 57868, Phoscon FR 903N, TTP (triphenyl phosphate), Phenyl phosphate ((PhO)3PO), Phosflex TPP, Triphenoxyphosphine oxide, Triphenol phosphate, TPPA, Sumilizer TPP. CAS No. 115-86-6. Pack Sizes: 1G. IUPAC Name: triphenyl phosphate. | |
| Triphenylsulfonium perfluoro-1-butanesufonate | electronic grade, ?99%. Group: Self assembly and lithography. | |
| Tripropylene glycol | 97%. Group: Hydrophobic polymersfood contact materials. Alternative Names: T 0651,Tripropylene glycol (6CI,7CI,8CI), [(1-Methyl-1,2-ethanediyl)bis(oxy)]bispropanol, TPG-H. | |
| Triruthenium dodecacarbonyl | 99%. Group: Vapor deposition precursors. | |
| Tris(2,2?-bipyridine)ruthenium(II) hexafluorophosphate | 97%. Group: Oled and pled materials. | |
| Tris(2,2?-bipyridyl)dichlororuthenium(II) hexahydrate | 99.95% trace metals basis. Group: Oled and pled materials. | |
| Tris[2-(4,6-difluorophenyl)pyridinato-C2,N]iridium(III) | 96%. Group: Oled and pled materials. | |
| Tris[2-(benzo[b]thiophen-2-yl)pyridinato-C3,N]iridium(III) | 96%. Group: Oled and pled materials. | |
| Tris(2-butoxyethyl) phosphate | analytical standard. Group: Flame retardants standardsflame retardantsfood contact materials. | |
| Tris(2-hydroxyethyl)methylammonium methylsulfate | ?95%. Group: Supercapacitors. | |
| Tris[3-(trimethoxysilyl)propyl] isocyanurate | technical grade. Group: Self assembly and lithography. | |
| Tris(4-carbazoyl-9-ylphenyl)amine | 97%. Group: Oled and pled materials. | |
| Tris(4-formylphenyl)amine | 97%. Group: Synthetic tools and reagents. | |
| Tris(4-tert-butylphenyl)sulfonium perfluoro-1-butanesulfonate | electronic grade, ?99% trace metals basis. Group: Self assembly and lithography. | |
| Tris(4-tert-butylphenyl)sulfonium triflate | electronic grade, ?99% trace metals basis. Group: Self assembly and lithography. | |
| Tris(cyclopentadienyl)gadolinium(III) | 99.9% trace metals basis. Group: Vapor deposition precursors. | |
| Tris(cyclopentadienyl)lanthanum(III) | 99.9% trace metals basis. Group: Vapor deposition precursors. | |
| Tris(cyclopentadienyl)thulium(III) | 99.9% trace metals basis. Group: Vapor deposition precursors. | |
| Tris(dibenzoylmethane) mono(1,10-phenanthroline)europium(lll) | 95%. Group: Oled and pled materials. | |
| Tris(diethylamido)(tert-butylimido)niobium(V) | packaged for use in deposition systems. Group: Vapor deposition precursors. | |
| [Tris(dimethylphenylphosphine)](2,5-norbornadiene)rhodium(I) hexafluorophosphate | 97%. Group: Self assembly and lithography. | |
| Tris(ethylmethylamido)(tert-butylimido)tantalum(V) | electronic grade, ?95% (CP), ?99.99% trace metals basis. Group: Vapor deposition precursors. | |
| Tris[N,N-bis(trimethylsilyl)amide]europium(III) | 98%. Group: Vapor deposition precursors. | |
| Tris[N,N-bis(trimethylsilyl)amide]lanthanum(III) | 98%. Group: Vapor deposition precursors. | |
| Tris[N,N-bis(trimethylsilyl)amide]ytterbium(III) | 98%. Group: Vapor deposition precursors. | |
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