Alfa Chemistry Materials 7 - Products
Alfa Chemistry Materials is specialized in material chemistry and offers an extensive catalog of materials in a wide range of applications, including Metals and Materials, 3D Printing Materials, Biomaterials.
| Product | Description | |
|---|---|---|
| Cetrimonium bromide | Cetrimonium bromide. Alternative Names: 1-Hexadecanaminium, N,N,N-trimethyl-, bromide;Cetyl trimethyl ammonium bromide;N,N,N-Trimethyl-1-hexadecanaminium bromide;CTAB;CETAB. CAS No. 57-09-0. Molecular formula: C19H42BrN. Mole weight: 364.45. Purity: 99%+. IUPAC Name: Hexadecyl(trimethyl)azanium;bromide. SMILES: CCCCCCCCCCCCCCCC[N+](C)(C)C.[Br-]. InChI: LZZYPRNAOMGNLH-UHFFFAOYSA-M. |  |
| Chalcone | Chalcone is isolated from Glycyrrhiza uralensis and used to synthesize chalcone derivatives. Chalcone derivatives possess varied biological and pharmacological activity, including anti-inflammatory, antioxidative, antibacterial, anticancer, and anti-parasitic activities. CAS No. 94-41-7. Molecular formula: C15H12O. Mole weight: 208.26 g/mol. Purity: 98+%. SMILES: O=C(/C=C/C1=CC=CC=C1)C2=CC=CC=C2. | |
| Chemically Functionalized Carbon Nanotubes | Chemically Functionalized Carbon Nanotubes. CAS No. 308068-56-6. Purity: >95wt% (MWNT). | |
| Chemically Modified Fullerenes | Chemically Modified Fullerenes. Purity: >99%. | |
| Chirality Controlled Single-walled Carbon Nanotubes | Chirality Controlled Single-walled Carbon Nanotubes. | |
| Chirality Controlled Single-walled Carbon Nanotubes: > 50 % are (7,6) chirality | Chirality Controlled Single-walled Carbon Nanotubes: > 50 % are (7,6) chirality. Purity: > 90 %. | |
| Chitin Nanoparticles | Chitin Nanoparticles. CAS No. 1398-61-4. Molecular formula: C30H50N4O19. Mole weight: 770.8g/mol. Purity: >99%. | |
| Chitosan Nanoparticles | Chitosan Nanoparticles. CAS No. 9012-76-4. Molecular formula: C6H11NO4. Mole weight: 161.15584 g/mol. Purity: >99.9%. | |
| Chitosan X9 Chitosan Nanoparticles Dispersion | Chitosan X9 Chitosan Nanoparticles Dispersion. CAS No. 9012-76-4. Purity: 99.9%. | |
| Chrome Carbide (Cr3C2) | Chrome Carbide (Cr3C2). Alternative Names: High Purity Chrome Carbide (Cr3C2); 99.9% Chrome Carbide (Cr3C2); 99.99% Chrome Carbide (Cr3C2); ; high purity chromium(II,III) carbide; high purity trichromium dicarbide; high purity chromium carbide. Purity: 3N-4N. | |
| Chromium Aluminium (Cr-Al) Alloy Sputtering Targets | Chromium Aluminium (Cr-Al) Alloy Sputtering Targets. Alternative Names: Chromium Aluminium (Cr-Al) Alloy Sputtering Targets, Cr-Al Alloy Sputtering Target, Cr-Al Alloy Sputter Target, Cr-Al Alloy Target, Chromium Aluminium Alloy Sputtering Target, Chromium Aluminium Alloy Sputter Target, Chromium Aluminium Alloy Target. Purity: 99.5%. | |
| Chromium Boride (CrB2) Sputtering Targets | Chromium Boride (CrB2) Sputtering Targets. Alternative Names: Chromium Boride (CrB2) Sputtering Targets, CrB2 Sputtering Target, CrB2 Sputter Target, CrB2 Target, Chromium Boride Sputtering Target, Chromium Boride Sputter Target, Chromium Boride Target. Purity: 99.5%. | |
| Chromium Boride (CrB) Sputtering Targets | Chromium Boride (CrB) Sputtering Targets. Alternative Names: Chromium Boride (CrB) Sputtering Targets, CrB Sputtering Target, CrB Sputter Target, CrB Target, Chromium Boride Sputtering Target, Chromium Boride Sputter Target, Chromium Boride Target. Purity: 99.5%. | |
| Chromium Carbide (Cr3C2) Sputtering Targets | Chromium Carbide (Cr3C2) Sputtering Targets. Alternative Names: Chromium Carbide (Cr3C2) Sputtering Targets, Cr3C2 Sputtering Target, Cr3C2 Sputter Target, Cr3C2 Target, Chromium Carbide Sputtering Target, Chromium Carbide Sputter Target, Chromium Carbide Target. Purity: 99.5%. | |
| Chromium carbide nanoparticles | Chromium carbide nanoparticles. Purity: > 99.99%. | |
| Chromium Carbide Nanopowder | Chromium Carbide Nanopowder. CAS No. 12012-35-0. Molecular formula: Cr3C2. Mole weight: 180.01 g/mol. Purity: 99.9%. | |
| Chromium Carbide Powder | Chromium Carbide Powder. Purity: 99.5%. | |
| Chromium Cobalt (Cr-Co) Alloy Sputtering Targets | Chromium Cobalt (Cr-Co) Alloy Sputtering Targets. Alternative Names: Chromium Cobalt (Cr-Co) Alloy Sputtering Targets, Cr-Co Alloy Sputtering Target, Cr-Co Alloy Sputter Target, Cr-Co Alloy Target, Chromium Cobalt Alloy Sputtering Target, Chromium Cobalt Alloy Sputter Target, Chromium Cobalt Alloy Target. Purity: 99.9%-99.95%. | |
| Chromium Copper (Cr-Cu) Alloy Sputtering Targets | Chromium Copper (Cr-Cu) Alloy Sputtering Targets. Alternative Names: Chromium Copper (Cr-Cu) Alloy Sputtering Targets, Cr-Cu Alloy Sputtering Target, Cr-Cu Alloy Sputter Target, Cr-Cu Alloy Target, Chromium Copper Alloy Sputtering Target, Chromium Copper Alloy Sputter Target, Chromium Copper Alloy Target. Purity: 99.9%-99.95%. | |
| Chromium (Cr) | Chromium (Cr). Alternative Names: High Purity Chromium (Cr); 99.9% Chromium (Cr); 99.99% Chromium (Cr); 99.999% Chromium (Cr). Purity: 3N-5N. | |
| Chromium (Cr) Evaporation Material | Chromium (Cr) Evaporation Material. Alternative Names: Cr Pellets, Cr Pieces, Chromium Pellets, Chromium Pieces, Chromium Evaporation Material, Cr Evaporation Material, Cr Evapor Materials, Chromium Evapor Materials. Purity: 99.5%-99.95%. | |
| Chromium (Cr) Sputtering Targets | Chromium (Cr) Sputtering Targets. Alternative Names: Chromium (Cr) Sputtering Targets, Cr Sputtering Target, Cr Sputter Target, Cr Target, Chromium Sputtering Target, Chromium Sputter Target, Chromium Target. Purity: 99.9%-99.95%. | |
| Chromium Doped Silicon Monoxide (Cr-SiO) Sputtering Targets | Chromium Doped Silicon Monoxide (Cr-SiO) Sputtering Targets. Alternative Names: Chromium Doped Silicon Monoxide (Cr-SiO) Sputtering Targets, Cr-SiO Alloy Sputtering Target, Cr-SiO Alloy Sputter Target, Cr-SiO Alloy Target, Chromium Doped Silicon Monoxide Alloy Sputter Target, Chromium Doped Silicon Monoxide Alloy Target. Purity: 99.9%-99.99%. | |
| Chromium-doped Yttrium-Aluminum Garnet (Cr: YAG) Crystal, Passive Q-switch | Chromium-doped Yttrium-Aluminum Garnet (Cr: YAG) Crystal, Passive Q-switch. Alternative Names: Chromium-doped Yttrium-Aluminum Garnet Crystal, Cr: YAG Crystal, Cr: YAG Wafers, Cr: YAG Substrate, Cr: YAG Slice. | |
| Chromium Fluoride (CrF3) Sputtering Targets | Chromium Fluoride (CrF3) Sputtering Targets. Alternative Names: Chromium Fluoride (CrF3) Sputtering Targets, CrF3 Sputtering Target, CrF3 Sputter Target, CrF3 Target, Chromium Fluoride Sputtering Target, Chromium Fluoride Sputter Target, Chromium Fluoride Target. Purity: 99.9%. | |
| Chromium II chloride | Chromium II chloride. CAS No. 10049-05-5. Molecular formula: Cl2Cr. Mole weight: 122.90g/mol. Purity: >97%. | |
| Chromium Iron (Cr-Fe) Alloy Sputtering Targets | Chromium Iron (Cr-Fe) Alloy Sputtering Targets. Alternative Names: Chromium Iron (Cr-Fe) Alloy Sputtering Targets, Cr-Fe Alloy Sputtering Target, Cr-Fe Alloy Sputter Target, Cr-Fe Alloy Target, Chromium Iron Alloy Sputtering Target, Chromium Iron Alloy Sputter Target, Chromium Iron Alloy Target. Purity: 99.9%. | |
| Chromium Nano Dispersion | Chromium Nano Dispersion. CAS No. 7440-62-2. Molecular formula: Cr. Mole weight: 52g/mol. Purity: 99.9%. | |
| Chromium Nanoparticle Dispersion | Chromium Nanoparticle Dispersion. Mole weight: 52. SMILES: [Cr]. InChI: InChI=1S/Cr. | |
| Chromium Nanoparticles | Chromium Nanoparticles. Purity: 99.8 %. | |
| Chromium Nanorods Properties | Chromium Nanorods Properties. CAS No. 7440-47-7. Mole weight: 51.9961 g/mol. Purity: (99%, 99.9%, 99.99%). | |
| Chromium Nickel (Cr-Ni) Alloy Sputtering Targets | Chromium Nickel (Cr-Ni) Alloy Sputtering Targets. Alternative Names: Chromium Nickel (Cr-Ni) Alloy Sputtering Targets, Cr-Ni Alloy Sputtering Target, Cr-Ni Alloy Sputter Target, Cr-Ni Alloy Target, Chromium Nickel Alloy Sputtering Target, Chromium Nickel Alloy Sputter Target, Chromium Nickel Alloy Target. Purity: 99.9%-99.95%. | |
| Chromium Nitrate Nanoparticles | Chromium Nitrate Nanoparticles. Mole weight: 400.15. IUPAC Name: chromium(3+) trinitrate. SMILES: [N+](=O)([O-])[O-].[N+](=O)([O-])[O-].[N+](=O)([O-])[O-].[Cr+3]. InChI: InChI=1S/Cr.3NO3/c;3*2-1(3)4/q+3;3*-1. | |
| Chromium Nitride (Cr2N) Sputtering Targets | Chromium Nitride (Cr2N) Sputtering Targets. Alternative Names: Chromium Nitride (Cr2N) Sputtering Targets, Cr2N Sputtering Target, Cr2N Sputter Target, Cr2N Target, Chromium Nitride Sputtering Target, Chromium Nitride Sputter Target, Chromium Nitride Target. Purity: 99.5%-99.9%. | |
| Chromium Nitride (CrN) Sputtering Targets | Chromium Nitride (CrN) Sputtering Targets. Alternative Names: Chromium Nitride (CrN) Sputtering Targets, CrN Sputtering Targets, CrN Targets, CrN Sputter Targets. Purity: 99.5%. | |
| Chromium Oxide (Cr2O3) | Chromium Oxide (Cr2O3). Alternative Names: High Purity Chromium Oxide (Cr2O3); 99.99% Chromium Oxide (Cr2O3); 99.999% Chromium Oxide (Cr2O3); ; high purity dichromium trioxide; high purity chromium(III) oxide; high purity chromium oxide. Purity: 4N-5N. | |
| Chromium Oxide (Cr2O3) Sputtering Targets | Chromium Oxide (Cr2O3) Sputtering Targets. Alternative Names: Chromium Oxide (Cr2O3) Sputtering Targets, Cr2O3 Sputtering Target, Cr2O3 Sputter Target, Cr2O3 Target, Chromium Oxide Sputtering Target, Chromium Oxide Sputter Target, Chromium Oxide Target. Purity: 99.9%. | |
| Chromium Oxide Nanoparticles (Cr2O3) | Chromium Oxide Nanoparticles (Cr2O3). Purity: ~ 99 %. | |
| Chromium Silicide (CrSi2) Sputtering Targets | Chromium Silicide (CrSi2) Sputtering Targets. Alternative Names: Chromium Silicide (CrSi2) Sputtering Targets, CrSi2 Sputtering Target, CrSi2 Sputter Target, CrSi2 Target, Chromium Silicide Sputtering Target, Chromium Silicide Sputter Target, Chromium Silicide Target. Purity: 99.5%. | |
| Chromium Silicide (CrSi) Sputtering Targets | Chromium Silicide (CrSi) Sputtering Targets. Alternative Names: Chromium Silicide (CrSi) Sputtering Targets, CrSi Sputtering Target, CrSi Sputter Target, CrSi Target, Chromium Silicide Sputtering Target, Chromium Silicide Sputter Target, Chromium Silicide Target. Purity: 99.5%. | |
| Chromium Silicon (Cr-Si) Alloy Sputtering Targets | Chromium Silicon (Cr-Si) Alloy Sputtering Targets. Alternative Names: Chromium Silicon (Cr-Si) Alloy Sputtering Targets, Cr-Si Alloy Sputtering Target, Cr-Si Alloy Sputter Target, Cr-Si Alloy Target, Chromium Silicon Alloy Sputtering Target, Chromium Silicon Alloy Sputter Target, Chromium Silicon Alloy Target. Purity: 99.95%. | |
| Chromium Silicon Monoxide (CrSiO) Sputtering Targets | Chromium Silicon Monoxide (CrSiO) Sputtering Targets. Alternative Names: Chromium Silicon Monoxide (CrSiO) Sputtering Targets, CrSiO Sputtering Target, CrSiO Sputter Target, CrSiO Target, Chromium Silicon Monoxide Sputtering Target, Chromium Silicon Monoxide Sputter Target, Chromium Silicon Monoxide Target. Purity: 99.9%. | |
| Chromium Vanadium (Cr-V) Alloy Sputtering Targets | Chromium Vanadium (Cr-V) Alloy Sputtering Targets. Alternative Names: Chromium Vanadium (Cr-V) Alloy Sputtering Targets, Cr-V Alloy Sputtering Target, Cr-V Alloy Sputter Target, Cr-V Alloy Target, Chromium Vanadium Alloy Sputtering Target, Chromium Vanadium Alloy Sputter Target, Chromium Vanadium Alloy Target. Purity: 99.9%-99.9%. | |
| Cis-Dichlorodiammine platinum (II), Cis-Pt(NH3)2Cl2 | Cis-Dichlorodiammine platinum (II), Cis-Pt(NH3)2Cl2. CAS No. 1314-91-6. | |
| Clay Nanoparticles | Clay Nanoparticles. CAS No. 1332-58-7. Mole weight: 540.46 g/mol. Purity: >99%. | |
| Clay Nanopowder | Clay Nanopowder. CAS No. 1332-58-7. Mole weight: 540.46 g/mol. Purity: >99%. | |
| Clay Nanopowder Montmorillonite | Clay Nanopowder Montmorillonite. Purity: 99%. | |
| CNT | CNT. Purity: 99%. | |
| CNT Conductive Electrostatic Water-based Coatings | CNT Conductive Electrostatic Water-based Coatings. | |
| CNT Conductive Ink | CNT Conductive Ink. CAS No. 308068-56-6. Purity: 99.9%. | |
| CNT Multiwall | CNT Multiwall. CAS No. 308068-56-6. Purity: >99wt% (MWNT). | |
| CNT NH2 | CNT NH2. CAS No. 308068-56-6. Purity: >98% (Ultra High Purity MWNT). | |
| CNTs >90%, OD: 50-80nm / Carbon Nanotubes | CNTs >90%, OD: 50-80nm / Carbon Nanotubes. Purity: Carbon nanotubes > 90wt%. | |
| CNTs >90%, OD: 8-15nm / Carbon Nanotubes | CNTs >90%, OD: 8-15nm / Carbon Nanotubes. Purity: Carbon nanotubes > 90wt%. | |
| CNT Single Wall | CNT Single Wall. CAS No. 308068-56-6. Purity: >90% (CNT Single Wall ). | |
| Co3O4 | Co3O4. Purity: 99%. | |
| Cobalt Aluminum (Co-Al) Alloy Sputtering Targets | Cobalt Aluminum (Co-Al) Alloy Sputtering Targets. Alternative Names: Cobalt Aluminum (Co-Al) Alloy Sputtering Targets, Co-Al Alloy Sputtering Target, Co-Al Alloy Sputter Target, Co-Al Alloy Target, Cobalt Aluminum Alloy Sputtering Target, Cobalt Aluminum Alloy Sputter Target, Cobalt Aluminum Alloy Target. Purity: 99.9%-99.99%. | |
| Cobalt Aluminum Oxide Nanoparticle Dispersion | Cobalt Aluminum Oxide Nanoparticle Dispersion. Mole weight: 176.89. SMILES: [Co+2].[O-][Al]=O.[O-][Al]=O. InChI: InChI=1S/2Al.Co.4O/q;;+2;;;2*-1. | |
| Cobalt Antimonide Alloy | Cobalt Antimonide Alloy. CAS No. 12052-42-5. Molecular formula: CoSb. Mole weight: 180.69g/mol. Purity: 99.99%. | |
| Cobalt Blue Liquid | Cobalt Blue Liquid. CAS No. 12672-27-4. Molecular formula: Co. Mole weight: 181.88. Purity: >99%. | |
| Cobalt Boron (Co-B) Alloy Sputtering Targets | Cobalt Boron (Co-B) Alloy Sputtering Targets. Alternative Names: Cobalt Boron (Co-B) Alloy Sputtering Targets, Co-B Alloy Sputtering Targets, CoB 85/15, CoB 80/20, Co-B Targets, Co-B Sputter Targets. Purity: 99.9%-99.95%. | |
| Cobalt Cadmium Selenide Core Shell Nanoparticles | Cobalt Cadmium Selenide Core Shell Nanoparticles. Purity: 99.9%. | |
| Cobalt Carbon-Coated nanoparticles | Cobalt Carbon-Coated nanoparticles. | |
| Cobalt Carbon Nanotubes / CNTs Doped with 50wt% Co Nanopowder | Cobalt Carbon Nanotubes / CNTs Doped with 50wt% Co Nanopowder. Purity: 97%. | |
| Cobalt Chromium Aluminium Ytterium Alloy Nanopartcles | Cobalt Chromium Aluminium Ytterium Alloy Nanopartcles. Mole weight: 226.81 g/mol. Purity: 99.9%. | |
| Cobalt Chromium (Co-Cr) Alloy Sputtering Targets | Cobalt Chromium (Co-Cr) Alloy Sputtering Targets. Alternative Names: Cobalt Chromium (Co-Cr) Alloy Sputtering Targets, Co-Cr Alloy Sputtering Target, Co-Cr Alloy Sputter Target, Co-Cr Alloy Target, Cobalt Chromium Alloy Sputtering Target, Cobalt Chromium Alloy Sputter Target, Cobalt Chromium Alloy Target. Purity: 99.95%. | |
| Cobalt Chromium Molybdenum Alloy Powder | Cobalt Chromium Molybdenum Alloy Powder. CAS No. 12629-02-6. Molecular formula: Co:Cr:Mo. Purity: 99.9%. | |
| Cobalt (Co) | Cobalt (Co). Alternative Names: High Purity Cobalt (Co); 99.9% Cobalt (Co); 99.99% Cobalt (Co); 99.999% Cobalt (Co). Purity: 3N-5N. | |
| Cobalt (Co) Evaporation Material | Cobalt (Co) Evaporation Material. Alternative Names: Co Pellets, Co Pieces, Cobalt Pellets, Cobalt Pieces, Cobalt Evaporation Material, Co Evaporation Material, Co Evapor Materials, Cobalt Evapor Materials. Purity: 99.99%. | |
| Cobalt (Co) Sputtering Targets | Cobalt (Co) Sputtering Targets. Alternative Names: Cobalt (Co) Sputtering Targets, Co Sputtering Target, Co Sputter Target, Co Target, Cobalt Sputtering Target, Cobalt Sputter Target, Cobalt Target. Purity: 99.9%-99.99%. | |
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