Alfa Chemistry Materials 7 - Products
Alfa Chemistry Materials is specialized in material chemistry and offers an extensive catalog of materials in a wide range of applications, including Metals and Materials, 3D Printing Materials, Biomaterials.
| Product | Description | |
|---|---|---|
| CVD Graphene on Quartz Substrate | CVD Graphene on Quartz Substrate. Purity: > 99.9%. |  |
| CVD Graphene On Silicon Substrate | CVD Graphene On Silicon Substrate. Purity: > 99.9%. | |
| CVD Graphene on Silicon Wafer | CVD Graphene on Silicon Wafer. Purity: > 99.9%. | |
| CVD Graphene on SiO2 Substrate | CVD Graphene on SiO2 Substrate. | |
| CVD Graphene on SiO2 Substrate/Wafer | CVD Graphene on SiO2 Substrate/Wafer. Purity: > 99.9%. | |
| CVD Graphene on Si/SiO2 (Graphene Factory) | CVD Graphene on Si/SiO2 (Graphene Factory). | |
| CVD Method Monolayer MoS2 | CVD Method Monolayer MoS2. | |
| CVD Method Monolayer MoS2 Film | CVD Method Monolayer MoS2 Film. | |
| CVD Method Monolayer WS2 | The CVD method monolayer WS2 is a promising member of Alfa Chemistry's family of 2D graphene-like materials. Among 2D materials with tailored morphologies designed to enhance their performance in nanoelectronics, WS2 is a particularly promising candidate. Alfa Chemistry's high quality WS2 layer films can be used as CVD grown films on sapphire, Al2O3 or SiO2 substrates. Whatever your purpose, you will be impressed with the performance and consistent quality of the CVD method monolayer WS2 from us. Mole weight: 247.98 g/mol. Purity: (6N) 99.9999% confirmed. SMILES: S=[W]=S. InChI: InChI=1S/2S.W. | |
| CVD Method Monolayer WSe2 | Tungsten selenide is a member of the group VI transition metal dichalcogenides, an important class of inorganic two-dimensional materials for various applications including photovoltaics, lithium-ion batteries, and FETs. CVD monolayer WSe2 on SiO2 substrate is just one of many advanced 2D materials we prepare and offer. Find high quality monolayer CVD WSe2 at Alfa Chemistry. Trust us to meet all your advanced material needs. Alternative Names: Tungsten selenide, Tungsten diselenide, Tungsten (IV) selenide. Mole weight: 341.76 g/mol. Purity: (6N) 99.9999% confirmed. SMILES: [Se]=[W]=[Se]. InChI: InChI=1S/2Se.W. | |
| CZ Silicon Wafers P-Type Boron | CZ Silicon Wafers P-Type Boron. | |
| D-Glucosamine 6-Phosphate Hydrate | D-Glucosamine 6-Phosphate Hydrate. CAS No. 3616-42-0. Molecular formula: C6H16NO9P. Mole weight: 277.17g/mol. Purity: 99.9%. | |
| Diamond Nanoparticle Dispersion | Diamond Nanoparticle Dispersion. Mole weight: 12.01. IUPAC Name: Carbon. SMILES: C. InChI: InChI=1S/C. | |
| Diamond Nanoparticles | Diamond Nanoparticles. Purity: 55 - 75 %. | |
| Dicalcium Silicate Submicron | Dicalcium Silicate Submicron. CAS No. 1344-95-2. Molecular formula: Ca2O4Si. Mole weight: 172.24g/mol. Purity: 99.9%. | |
| Dimethylglycine Powder | Dimethylglycine Powder. CAS No. 1118-68-9. Molecular formula: C4H9NO2. Mole weight: 103.12 g/mol. Purity: 99.9 %. | |
| Dipotassium phosphate (K2HPO4) | Dipotassium phosphate (K2HPO4). Alternative Names: High Purity Dipotassium phosphate (K2HPO4); High Purity Dipotassium phosphate Anhydrous. Purity: 5N. | |
| Disodium Hydrogen Phosphate Submicron | Disodium Hydrogen Phosphate Submicron. CAS No. 7558-79-4. Molecular formula: Na2HPO4. Mole weight: 141.96 g/mol. Purity: 99.9%. | |
| Doped Tin Oxide Nanoparticles/Nanopowder Dispersion in Alcohols(DTO), 20wt% | Doped Tin Oxide Nanoparticles/Nanopowder Dispersion in Alcohols(DTO), 20wt%. | |
| Doped Tin Oxide Nanoparticles/Nanopowder Dispersion in Alcohols(DTO), 40wt% | Doped Tin Oxide Nanoparticles/Nanopowder Dispersion in Alcohols(DTO), 40wt%. | |
| Doped Tin Oxide Nanoparticles/Nanopowder Dispersion in Aromatic(DTO), 20wt% | Doped Tin Oxide Nanoparticles/Nanopowder Dispersion in Aromatic(DTO), 20wt%. | |
| Doped Tin Oxide Nanoparticles/Nanopowder Dispersion in Aromatic(DTO), 40wt% | Doped Tin Oxide Nanoparticles/Nanopowder Dispersion in Aromatic(DTO), 40wt%. | |
| Doped Tin Oxide Nanoparticles/Nanopowder Dispersion in Water(DTO), 20wt% | Doped Tin Oxide Nanoparticles/Nanopowder Dispersion in Water(DTO), 20wt%. | |
| Doped Tin Oxide Nanoparticles/Nanopowder Dispersion in Water(DTO), 40wt% | Doped Tin Oxide Nanoparticles/Nanopowder Dispersion in Water(DTO), 40wt%. | |
| Double Wall Carbon Nanotubes | Double Wall Carbon Nanotubes. Purity: >80wt%. | |
| Double wall carbon nanotubes [DWNTs] | Double wall carbon nanotubes [DWNTs]. Purity: >80wt%. | |
| Double-walled Carbon Nanotubes | Double-walled Carbon Nanotubes. CAS No. 308068-56-6. Mole weight: 12.01. Purity: > 98wt%. IUPAC Name: Carbon. SMILES: C. InChI: InChI=1S/C. | |
| Double-walled Carbon Nanotubes | Double-walled Carbon Nanotubes. Purity: powder. | |
| Double Walled Carbon Nanotubes | Double Walled Carbon Nanotubes. CAS No. 308068-56-6. Purity: 98% (DWCNT). | |
| Double Walled Carbon Nano Tubes | Double Walled Carbon Nano Tubes. Purity: > 65%. | |
| Double-Walled Carbon Nanotubes Properties | Double-Walled Carbon Nanotubes Properties. CAS No. 308068-56-6. Mole weight: 12.01 g/mol. Purity: (99%, 99.9%, 99.99%). | |
| Double Walled CNT | Double Walled CNT. CAS No. 308068-56-6. Molecular formula: C. Mole weight: 12.01g/mol. | |
| DWCNTs, Double-walled Carbon Nanotubes, >60% | DWCNTs, Double-walled Carbon Nanotubes, >60%. Purity: Carbon nanotubes > 90wt%. | |
| DWNTs(Functionalized) | DWNTs(Functionalized). Purity: >60wt%. | |
| Dyed Polystyrene Latex Microbeads | Dyed Polystyrene Latex Microbeads. | |
| Dysprosium (Dy) | Dysprosium (Dy). Alternative Names: High Purity Dysprosium (Dy); 99.9% Dysprosium (Dy); 99.99% Dysprosium (Dy); 99.999% Dysprosium (Dy). Purity: 3N-5N. | |
| Dysprosium (Dy) Evaporation Material | Dysprosium (Dy) Evaporation Material. Alternative Names: Dy Pellets, Dy Pieces, Dysprosium Pellets, Dysprosium Pieces, Dysprosium Evaporation Material, Dy Evaporation Material, Dy Evapor Materials, Dysprosium Evapor Materials. Purity: 99.99%. | |
| Dysprosium (Dy) Sputtering Targets | Dysprosium (Dy) Sputtering Targets. Alternative Names: Dysprosium (Dy) Sputtering Targets, Dy Sputtering Target, Dy Sputter Target, Dy Target, Dysprosium Sputtering Target, Dysprosium Sputter Target, Dysprosium Target. Purity: 99.99%. | |
| Dysprosium Fluoride (DyF3) | Dysprosium Fluoride (DyF3). Alternative Names: High Purity Dysprosium Fluoride (DyF3); 99.9% Dysprosium Fluoride (DyF3); 99.99% Dysprosium Fluoride (DyF3); ; high purity dysprosium trifluoride; high purity dysprosium(III) fluoride; high purity dysprosium fluoride. Purity: 3N-4N. | |
| Dysprosium Fluoride (DyF3) Sputtering Targets | Dysprosium Fluoride (DyF3) Sputtering Targets. Alternative Names: Dysprosium Fluoride (DyF3) Sputtering Targets, DyF3 Sputtering Target, DyF3 Sputter Target, DyF3 Target, Dysprosium Fluoride Sputtering Target, Dysprosium Fluoride Sputter Target, Dysprosium Fluoride Target. Purity: 99.99%. | |
| Dysprosium Nanoparticle Dispersion | Dysprosium Nanoparticle Dispersion. Mole weight: 162.5. SMILES: [Dy]. InChI: InChI=1S/Dy. | |
| Dysprosium Oxide (Dy2O3) | Dysprosium Oxide (Dy2O3). Alternative Names: High Purity Dysprosium Oxide (Dy2O3); 99.99% Dysprosium Oxide (Dy2O3); 99.999% Dysprosium Oxide (Dy2O3); ; high purity didysprosium trioxide; high purity dysprosium(III) oxide; high purity dysprosium oxide. Purity: 4N-5N. | |
| Dysprosium Oxide (Dy2O3) Sputtering Targets | Dysprosium Oxide (Dy2O3) Sputtering Targets. Alternative Names: Dysprosium Oxide (Dy2O3) Sputtering Targets, Dy2O3 Sputtering Target, Dy2O3 Sputter Target, Dy2O3 Target, Dysprosium Oxide Sputtering Target, Dysprosium Oxide Sputter Target, Dysprosium Oxide Target. Purity: 99.99%. | |
| Dysprosium Oxide Nanoparticle Dispersion | Dysprosium Oxide Nanoparticle Dispersion. Mole weight: 373. IUPAC Name: Dysprosium(+3) cation; oxygen(-2) anion. SMILES: [Dy+3].[Dy+3].[O-2].[O-2].[O-2]. InChI: InChI=1S/2Dy.3O/q2*+3;3*-2. | |
| Dysprosium oxide nanoparticles | Dysprosium oxide nanoparticles. | |
| Dysprosium Oxide Nanopowder | Dysprosium Oxide Nanopowder. Purity: >99.9%. | |
| Easy Transfer: Monolayer Graphene on Polymer Film | Easy Transfer: Monolayer Graphene on Polymer Film - Processed in Clean Room Class 1000 We applied our long experience in growing and transferring high quality graphene films to let you experiment with any novel substrate. | |
| Electrical Conductivity Carbon Nanotubes (SWCNTs) | Electrical Conductivity Carbon Nanotubes (SWCNTs). CAS No. 308068-56-6. Purity: >98% (SWNT) Electric current density >10-2S/cm. | |
| Electronic Magnet Pole Identifier | Electronic Magnet Pole Identifier. | |
| Endohedral Fullerenes | Endohedral Fullerenes (or Metallofullerenes) are a novel type of fullerene with a central metallic atom encapsulated in its cage structure. | |
| epoxycyclohexyl POSS | epoxycyclohexyl POSS. CAS No. 187333-74-0. Molecular formula: (C8H13O)n(SiO1.5)n. Mole weight: 1418.20 g/mol. Purity: 0.98. | |
| Epoxy-Functionalized Magnetic Nanoparticles(30mg/mL,0.5-0.6μm) | The surface of the super paramagnetic Fe3O4 nanoparticle is covalently functionalized with rich carboxyl groups, and can be used for further functionalization. | |
| Erbium-Doped Yttrium Aluminium Garnet (Er: YAG) Laser Crystal | Erbium-Doped Yttrium Aluminium Garnet (Er: YAG) Laser Crystal. Alternative Names: Er: YAG Wafers, Er: YAG Substrate, Er: YAG Slice, Erbium-Doped Yttrium Aluminium Garnet Wafers, Erbium-Doped Yttrium Aluminium Garnet Substrate, Erbium-Doped Yttrium Aluminium Garnet Slice. | |
| Erbium (Er) | Erbium (Er). Alternative Names: High Purity Erbium (Er); 99.9% Erbium (Er); 99.99% Erbium (Er); 99.999% Erbium (Er). Purity: 3N-5N. | |
| Erbium (Er) Evaporation Material | Erbium (Er) Evaporation Material. Alternative Names: Er Pellets, Er Pieces, Erbium Pellets, Erbium Pieces, Erbium Evaporation Material, Er Evaporation Material, Er Evapor Materials, Erbium Evapor Materials. Purity: 99.99%. | |
| Erbium (Er) Sputtering Targets | Erbium (Er) Sputtering Targets. Alternative Names: Erbium (Er) Sputtering Targets, Er Sputtering Target, Er Sputter Target, Er Target, Erbium Sputtering Target, Erbium Sputter Target, Erbium Target. Purity: 99.9%. | |
| Erbium Fluoride (ErF3) | Erbium Fluoride (ErF3). Alternative Names: High Purity Erbium Fluoride (ErF3); 99.9% Erbium Fluoride (ErF3); 99.99% Erbium Fluoride (ErF3); ; high purity erbium trifluoride; high purity erbium(III) fluoride; high purity erbium fluoride; high purity erbium fluoride. Purity: 3N-4N. | |
| Erbium Fluoride (ErF3) Sputtering Targets | Erbium Fluoride (ErF3) Sputtering Targets. Alternative Names: Erbium Fluoride (ErF3) Sputtering Targets, ErF3 Sputtering Target, ErF3 Sputter Target, ErF3 Target, Erbium Fluoride Sputtering Target, Erbium Fluoride Sputter Target, Erbium Fluoride Target. Purity: 99.99%. | |
| Erbium Nanoparticle Dispersion | Erbium Nanoparticle Dispersion. Mole weight: 382.56. SMILES: [Er]. InChI: InChI=1S/Er. | |
| Erbium Oxide (Er2O3) | Erbium Oxide (Er2O3). Alternative Names: High Purity Erbium Oxide (Er2O3); 99.9% Erbium Oxide (Er2O3); 99.99% Erbium Oxide (Er2O3); ; high purity dierbium trioxide; high purity erbium(III) oxide; high purity erbium oxide. Purity: 3N-4N. | |
| Erbium Oxide (Er2O3) Sputtering Targets | Erbium Oxide (Er2O3) Sputtering Targets. Alternative Names: Erbium Oxide (Er2O3) Sputtering Targets, Er2O3 Sputtering Target, Er2O3 Sputter Target, Er2O3 Target, Erbium Oxide Sputtering Target, Erbium Oxide Sputter Target, Erbium Oxide Target. Purity: 99.99%. | |
| Erbium Oxide Nanoparticle Dispersion | Erbium Oxide Nanoparticle Dispersion. Mole weight: 382.56. IUPAC Name: Erbium(3+); oxygen(2-). SMILES: O=[Er]O[Er]=O. InChI: InChI=1S/2Er.3O. | |
| Erbium oxide nanoparticles | Erbium oxide nanoparticles. | |
| Europium doped Gadolinium Oxysulfide Nanopowder | Europium doped Gadolinium Oxysulfide Nanopowder. CAS No. 68609-43-8. Molecular formula: Gd2O2S:Eu. Mole weight: 537.49 g/mol. Purity: 99.9%. | |
| Europium (Eu) Evaporation Material | Europium (Eu) Evaporation Material. Alternative Names: Eu Pellets, Eu Pieces, Europium Pellets, Europium Pieces, Europium Evaporation Material, Eu Evaporation Material, Eu Evapor Materials, Europium Evapor Materials. Purity: 99.99%. | |
| Europium (Eu) Sputtering Targets | Europium (Eu) Sputtering Targets. Alternative Names: Europium (Eu) Sputtering Targets, Eu Sputtering Target, Eu Sputter Target, Eu Target, Europium Sputtering Target, Europium Sputter Target, Europium Target. Purity: 99.99%. | |
| Europium Fluoride (EuF2) | Europium Fluoride (EuF2). Alternative Names: Europiumdi Fluoride. Purity: 99%-99.99%. | |
| Europium Metal Organic Framework | Europium Metal Organic Framework. CAS No. 7440-53-1. Molecular formula: Eu (NO3)3·6H2O. Mole weight: 158.925 g/mol. Purity: 99%. | |
| Europium Metal-Organic Framework | Europium Metal-Organic Framework. CAS No. 7440-53-1. Molecular formula: Eu (NO3)3·6H2O. Mole weight: 158.925 g/mol. Purity: 99%. | |
| Europium Nanoparticle Dispersion | Europium Nanoparticle Dispersion. Mole weight: 151.97. SMILES: [Eu]. InChI: InChI=1S/Eu. | |
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